Hardware Reference
In-Depth Information
1.2.1.1
Full
Open Defects in Interconnect Lines
In this subsection, we first review the classical model for
full
opens in interconnect
lines capacitively coupled with neighboring lines. As traditionally considered, tun-
neling currents are assumed negligible. Next, thin open defects are described, and
finally interconnect
full
open defects with gate leakage are modeled.
Full
Open Defect Modeling in the Interconnect Paths
An interconnect line with a
full
open is disconnected from its driver and becomes
electrically floating. This line may, in turn, drive one (or more) transistor pair(s).
an inverter. The floating line voltage .V
FL
/ is determined by (a) the surrounding
circuitry, (b) the transistor capacitances of the driven gates, and (c) the initial trapped
charge (
Konuk
1997
;
Champac and Zenteno
2000
;
Arumı et al.
2005
), as reviewed
next.
a.
Neighboring interconnect lines routed close to the floating line add parasitic cou-
capacitances to the ground .C
SUBS
/ and to the power plane .C
WELL
/. Without
of these capacitances depends on the dielectric filling the space, the distance be-
tween lines and their physical dimensions.
b.
Another set of parasitic capacitances influencing the interconnect line is made
up of the parasitic capacitances of the transistors driven by the floating line.
These capacitances consist of gate drain
C
gd
,gatesource
C
gs
and gate bulk
C
gb
capacitances from both the pMOS and nMOS transistors of the down-
stream gate(s). The exact value of these transistor capacitances varies with the
conduction state of the transistors.
C
gs(p)
C
gb(p)
N
1
N
3
N
m
C
N1
C
N3
C
Nm
C
WELL
C
gd(p)
I
N
FL
Driving
gate
OUT
C
gd(n)
C
N2
C
SUBS
C
gb(n)
N
2
C
gs(n)
Fig. 1.3
Electrical model for an interconnect
full
open