Image Processing Reference
In-Depth Information
Overflow control gate
Overflow drain
PD
VCCD
p -Sub
(a)
Excess charges
Overflow barrier
PD
VCCD
Overflow drain
(b)
FIGURE 5.17
Lateral overflow drain: (a) cross-sectional view, (b) potential distribution.
As shown in Figure 5.18, the PD and VCCD are arranged in a p -well formed on the sur-
face side of the n -type substrate. Zero volt or GND potential and positive voltage V-sub
are applied to the p -well and n -substrate, respectively. The potential distribution along
the A-A' line in Figure 5.18a is shown in Figure 5.18b. It is important that the p -region
between the PD and n -substrate is completely depleted and the potential can be controlled
by applied voltage V-sub, so that excess charges in the PD are discharged to the n -substrate
before they overflow to the VCCD channel. Since the potential of the overflow control
Readout part
VCCD
Photodiode
p +
n -
n -
A
p
p -
p -well
V-sub
n -substrate
A′
(a)
Depleted
A′ depth direction
A
p -
Readout part
n -substrate
Photodiode
VCCD
Discharge of excess charges
Saturation level
Overflow control barrier
Readout
operation
V-sub
(b)
FIGURE 5.18
Vertical overflow drain structure in an IT-CCD: (a) cross-sectional view of the pixel; (b) potential distribution
along the A-A' line in (a).
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