Chemistry Reference
In-Depth Information
7
Surface and Thin Film
Analysis
CONTENTS
7.1 Fourier Transform Infrared Spectroscopy ................................... 258
7.1.1 Basics of Absorption Spectroscopy in the Mid-Infrared
Spectral Range ....................................................... 258
7.1.2 Principle of Fourier Transform Infrared Spectroscopy ............ 261
7.1.3 IR Spectroscopic Techniques for Analysis of Interfaces
andThinFilms....................................................... 263
7.1.3.1 Infrared Reflection-Absorption Spectroscopy........... 264
7.1.3.2 Evanescent Wave Spectroscopy .......................... 265
7.1.3.3 Internal Reflection Element Using Mid-Infrared
Transmitting Fiber ........................................ 267
7.2 X-Ray Photoelectron Spectroscopy (XPS) .................................. 271
7.2.1 Experimental Setup .................................................. 271
7.2.2 Analysis of XPS Spectra ............................................ 273
7.2.3 Actual Trends in X-Ray Photoelectron Spectrometry
Development......................................................... 274
7.3 Analysis with Ion Beams by Energy Loss Spectroscopy ................... 276
7.3.1 Rutherford Backscattering Spectrometry ........................... 276
7.3.2 Elastic Recoil Detection Analysis................................... 277
7.4 Matrix-Assisted Laser Desorption/Ionization, Secondary Ion Mass
Spectrometry.................................................................. 278
7.5 X-RayDiffractionandReflection ........................................... 280
7.5.1 Grazing Incidence X-Ray Diffractometry .......................... 280
7.5.2 X-RayReflectometry................................................ 282
7.6 Radical Investigation by Electron Spin Resonance ......................... 282
An important application of plasma chemistry is the reactive treatment of surfaces
and the deposition of thin films. The analysis of these surfaces and films is essential
for understanding of the mechanisms of the treatment and deposition processes which
facilitate developments and optimization activities, too. The diagnostics include con-
ventional chemical, like elementary analysis, and physical methods, like microscopy,
or methods which are specially developed for this purpose. An overview on thin
film and surface properties and corresponding diagnostic methods are presented in
Table 7.1.
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