Chemistry Reference
In-Depth Information
software features that further extend its performance. All system functions are controlled
by powerful microprocessor electronics, which make routine analysis a simple push-
button exercise and provide extensive safeguards against operator error. The
microprocessor also contains sufficient analytical software to permit stand-alone
emergency operation, plus a range of self-diagnostic service-testing routines.
The main characteristics of this instrument are as follows:
• Identifies all elements from boron to uranium
• Choice of side window X-ray tubes allows optimum excitation for all applications
• New detectors and crystals bring improved light-element performance
• 100kV programmable excitation enhances heavy-element detection
• Special calibration features give more accurate results:
- auxiliary collimator provides high resolution
- programmable channel mask reduces background
- fast digital scanning speeds data collection
- high angular accuracy aids positive identification
• Powerful software includes automatic peak labelling
• Compact one-cabinet system
• Distributed intelligence via five microprocessors
• High-frequency generator cuts running costs and improves stability
• New high-speed electronics allows operation at one million counts per second
• System self-selects analytical programs for unknowns
• Surface-down sample presentation aids accurate analysis of liquids
• Small airlock speeds sample throughput, cuts helium costs
• Designed for laboratory automation
• Front panel continuously displays system status
• New generation software for DEC computers
• Computer dialogue in English, French, German and Spanish
• Colour graphics simplify results interpretation
• Extensive programming, reporting, editing facilities available.
The layout of the Philips PW 1404 instrument is shown in Fig. 1.2.
Unique among XRF instruments the EXTRA II TXRF spectrometer yields lower limits
of detection in the region of 10pg (1pg=10−12g) for more than 60 elements, eg 5-10pg
for chlorine, 10-30pg for phosphorus and sulphur and 30-100pg for silicon.
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