EFFICIENCY AND EVALUATION - Total-Reflection X-Ray Fluorescence Analysis and Related Methods - page 422

Figure6.13. Schematic view of a novel UHV sample chamber placed on a movable base frame.
It can be attached to a synchrotron beamline, samples are transferred through a load-lock to the
sample manipulator inside the chamber, and two energy-dispersive detectors can be used for
analysis. Figure from Ref. [117], reproduced with permission. Copyright2013, American Institute
of Physics.
The instrument was commissioned and applied to the characterization of
deposited and implanted or buried layers, and of interfaces in the nanometer
regime [117]. Light elements, like B, C, N, and Al, could be detected.
Measurements were carried out using the linear polarization of the synchrotron
beam. In particular, it was proved again that XRR and GI-XRF are comple-
mentary techniques. A simultaneous analysis can lead to a corrected model for
a layered sample and can allow an improved calculation avoiding systematic
errors of both methods.
Until 2014, three work places could be provided with chamber and patent-
pending manipulator for 100 × 100 mm 2 samples. The first work place was
opened at the PTB beamline of BESSY II in Berlin, Germany, in 2012 and