Biomedical Engineering Reference
In-Depth Information
channel. In the channel, the density of electrons overcomes the hole density, and it
reaches its maximum value for
s D 2 F ;
(2.2)
where F .E i E F /=e D .k B T=e/ln.N s =n i / is the Fermi potential. In ( 2.2 ), E i
and n i are, respectively, the intrinsic energy and concentration of charge carriers; E F
denotes the Fermi energy; and the C or sign is associated to the p -type or n -type
substrate, respectively. The maximum width of the depletion layer is then given by
x dep;max D Œ4" s k B T ln.N s =n i /=.e 2 N s / 1=2 ;
(2.3)
and the corresponding charge per unit area is
q dep D eN s x dep :
(2.4)
The threshold voltage can be determined from the equality
V th D V fb C 2 F q dep =C ox ;
(2.5)
where V fb is the flat band voltage, which corresponds to a gate voltage that does not
bend the substrate energy bands, and C ox is the dielectric capacitance per unit area.
Typical values for V th are situated in the 0.2-0.4 V range.
The electric charge in the inversion layer is finally given by the expression
q n D C ox .V G V th /;
(2.6)
which shows that it is directly proportional to the gate voltage, as is the current.
The MOSFET, as can be seen from Fig. 2.2 , consists of two diode regions named
source S and drain D, which surround a MOS capacitor. The voltage between source
and drain is denoted by V D , while V G stands for the voltage between gate G and
source. The electrons in the channel are transported toward the drain if the drain
is forward biased with V D , case in which V G >V th , the electron distribution being
V G
V D
SiO 2
G
D
S
p -Si
channel
depletion layer
Fig. 2.2
The MOSFET transistor
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