Biomedical Engineering Reference
In-Depth Information
channel. In the channel, the density of electrons overcomes the hole density, and it
reaches its maximum value for
s
D
2
F
;
(2.2)
where
F
D˙
.E
i
E
F
/=e
D
.k
B
T=e/ln.N
s
=n
i
/ is the Fermi potential. In (
2.2
), E
i
and n
i
are, respectively, the intrinsic energy and concentration of charge carriers; E
F
denotes the Fermi energy; and the
C
or
sign is associated to the
p
-type or
n
-type
substrate, respectively. The maximum width of the depletion layer is then given by
x
dep;max
D
Œ4"
s
k
B
T ln.N
s
=n
i
/=.e
2
N
s
/
1=2
;
(2.3)
and the corresponding charge per unit area is
q
dep
D
eN
s
x
dep
:
(2.4)
The threshold voltage can be determined from the equality
V
th
D
V
fb
C
2
F
q
dep
=C
ox
;
(2.5)
where V
fb
is the flat band voltage, which corresponds to a gate voltage that does not
bend the substrate energy bands, and C
ox
is the dielectric capacitance per unit area.
Typical values for V
th
are situated in the 0.2-0.4 V range.
The electric charge in the inversion layer is finally given by the expression
q
n
D
C
ox
.V
G
V
th
/;
(2.6)
which shows that it is directly proportional to the gate voltage, as is the current.
The MOSFET, as can be seen from Fig.
2.2
, consists of two diode regions named
source S and drain D, which surround a MOS capacitor. The voltage between source
and drain is denoted by V
D
, while V
G
stands for the voltage between gate G and
source. The electrons in the channel are transported toward the drain if the drain
is forward biased with V
D
, case in which V
G
>V
th
, the electron distribution being
V
G
V
D
SiO
2
G
D
S
p
-Si
channel
depletion layer
Fig. 2.2
The MOSFET transistor
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