Biomedical Engineering Reference
In-Depth Information
Table 2.1
Reported selectively sacrifical diblock copolymer materials and
etching methods
Sacrificial
component
Etching method
Matrix material Geometry
a
Morphology
b
Ref.
PMMA
UV (254nm) irradiation
PS
F
C*
55
and acetic acid rinse
PS
F
L
38
P2VP
F
C*
57
PLA
0.05 M NaOH
at RT
PS
B
C
49
(
aq
)
PS
B
G
58
PS
F
C*
59, 60
PFS
F
G*
61
PFS
F
C*
54
PCHE
B
C*
62
PEO
C onc HI
PS
B
G
58, 63
(aq)
PI
Ozonolysis
PS
B
G
64, 65
UV Irradiation
PS
B
G
66
1, 4 - diiodobutane +
P2VP
B
G
67, 68
Ozonolysis
UV Irradiation in 2% Ozone
PMDSS
B
G
69
PMDS
Hydrofluoric Acid
PS
B
G
50
F = Film, B = Bulk samples.
a
c = Cylindrical, G = Gyroid, L = Lamellar.
*Copolymer templates replicated electrochemically or used as an
electrochemical etching mask.
PMMA = poly(methylmethacrylate), PLA = poly(lactide),
PS = poly(styrene), PFS = poly(4-fluorostyrene),
PEO = poly(ethyleneoxide), P2VP = poly(2-vinylpyridine),
PI = poly(isoprene), PMDSS = poly(pentamethyldisilylstyrene),
PDMS = poly(dimethylsiloxane), PCHE = poly(cyclohexylethylene).
b
2.4.1 Nondegradaive Routes to Porous Templates
In films thin enough to comprise only a monolayer of BCP domains,
porous structures can be achieved without necessarily chemically
degrading one component. One possibility is to mix a low molecular
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