Environmental Engineering Reference
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Figure 10.4.2 Schematic representation of the band bending effect for (a) an n-type semiconductor
and (b) a p-type semiconductor.
of transferred charge to the surface of the semiconductor and the density of shallow
donors in the semiconductor material, N D .
d 2
d x 2
1
εε 0 ρ ( x )
d ξ
d x
=−
=−
(10.4.11)
ε and ε 0 are the dielectric constant and the permittivity of free space, respectively. ξ is
the electric field and the total charge density ρ is given by (Krol and Grätzel, 2012):
e [ N D
ρ ( x )
=
n ( x )]
(10.4.12)
where x is the distance from the surface, N D is ionized donor density, given by the
doping of the semiconducting material - Equation 10.4.9. The concentration of free
electrons, n ( x ) varies with distance - Equation 10.4.5.
Since the Fermi level is expected to be constant within the space charge region,
the position of the conduction band energy E C ( x ) varies with the distance by the band
bending effect, ( x ), as follows:
N C exp
n 0 exp e ( x )
kT
E C ( x )
E F
e ( x )
n ( x )
=
=
(10.4.13)
kT
 
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