Environmental Engineering Reference
In-Depth Information
For the slow diffusion which we consider in this section, the domain of variation
of x can be viewed as
. When manufacturing the silicon
transistors, there is no source of mixed material inside the silicon plates. Therefore,
we only consider Cauchy problems of homogeneous diffusion equations.
<
x
< +
or 0
x
< +
3.6.2 Diffusion from a Constant Source
Diffusion from a constant source refers to the particle diffusion in a semi-infinite
domain without initial distribution of particles from a constant source of density N 0
at x
=
0. Diffusion in closed tubes and boxes are all of this kind. The particle density
N
(
x
,
t
)
should thus satisfy the PDS
N t =
DN xx ,
0
<
x
< + ,
0
<
t
,
N
(
0
,
t
)=
N 0 ,
(3.57)
N
(
x
,
0
)=
0
.
Let N
(
x
,
t
)=
v
(
x
,
t
)+
N 0 ; thus v
(
x
,
t
)
is the solution of a PDS with homogeneous
boundary conditions
=
,
<
< + ,
<
,
v t
Dv xx
0
x
0
t
(
,
)=
,
v
0
t
0
(3.58)
v
(
x
,
0
)=
N 0
.
By an odd continuation, PDS (3.58) becomes
v t =
Dv xx , − <
x
< + ,
0
<
t
,
N 0 ,
x
>
0
,
(3.59)
v
(
0
,
t
)=
0
,
v
(
x
,
0
)=
0
,
x
=
0
,
N 0 ,
x
<
0
.
Note that the boundary homogenization and the continuation of the initial contribu-
tion indeed preserve the CDS in (3.57).
The solution of PDS (3.59) is, by the result in Section 3.4,
0
+
v
(
x
,
t
)=
N 0 V
(
x
, ξ ,
t
)
d
ξ +
(
N 0 )
V
(
x
, ξ ,
t
)
d
ξ .
0
ξ
2 Dt
x
η = ξ
x
2 Dt
After performing the variable transformation of
η =
and
for the
 
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