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Fig. 5 The irregular coating patterns in the emissive material due to instability with respect to
the solution concentration, 1, 0.75, 0.5 and 0.25 wt%. The lower concentration improves the film
quality, the irregular pattern disappear in the case of 0.25 w%. The other coating condition are
80 m/min, 200 LPI (line per inch), 22 lm of the gravure cell depth
Fig. 6 The irregular coating patterns in iI-T3:PC 71 BM blend PV material due to instability with
respect to the blade-coating speed, 20, 16, 12 and 8 mm/s. Clearly lower speed removes
instability and leads to uniform film
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