Chemistry Reference
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exist in the case of 100% O
2
plasma etching. The benzene ring is easily
fluorinated by fluorine radicals, and the fluorinated benzene easily breaks
down due to the oxygen radicals.
Nitrogen converts CO
2
or COF
2
to CO and re-produces atomic oxygen which is
the active species for the etching.
REFERENCES
1. M.K. Ghosh and K.L. Mittal (Eds.),
Polyimides: Fundamentals and Applications
, Marcel Dek-
ker, New York (1996).
2. K.L. Mittal (Ed.),
Polyimides and Other High Temparature Polymers
, Vol.1, VSP, Utrecht
(2001).
3. Y. Nakamura, Y. Suzuki and Y. Watanabe,
Thin Solid Films
, 290-291, 367 (1996).
4. N. Inagaki, S. Tasaka and K. Hibi,
J. Polym. Sci. Part A
,
, 1425 (1992).
5. J.E. Klemberg-Sapieha, L. Martinu, E. Sacher and M.R. Wertheimer,
Soc. Plast. Eng. Annu.
Tech. Conf.,
49, 1093 (1991).
6. E. Occhiello, M. Morra, G. Morini, F. Garbassi and D. Johnson,
J. Appl. Polym. Sci.
, 42, 2045
(1991).
7. A.D. Katnani, A. Knoll and M.A. Mycek,
J. Adhesion. Sci. Technol.
, 3, 441 (1989).
8. I.S. Goldstein and F. Kalk,
J. Vac. Sci. Technol.
,
30
, 743 (1981).
9. S. Iwamori, T. Miyashita, S. Fukuda, N. Fukuda and K. Sudoh,
J. Vac. Sci. Technol.
, B15, 53
(1997).
10. S. Iwamori, T. Miyashita, S. Fukuda, S. Nozaki, K. Sudoh and N. Fukuda,
J. Adhesion. Sci.
Technol.
, 11, 783 (1997).
11. F.D. Egitto, F. Emmi, R.S. Horwath and V. Vukanovic,
J. Vac. Sci. Technol
., B3, 893 (1985).
12. M. Kogoma and G. Turban,
Plasma Chem. Plasma Proc.,
6, 349 (1986).
13. G. Turban and M. Rapeaux,
J. Electrochem. Soc
., 130, 2231 (1983).
14. J.A. Folta and R.C. Alkire,
J. Electrochem. Soc.
, 137, 3173 (1990).
15. A.M. Wrobel, B. Lamontagne and M.R. Wertheimer,
Plasma Chem. Plasma Process.
, 8, 315
(1988).
16. G. Sauve and M. Moisan,
Appl. Phys. Lett.
, 53, 470 (1988).
17. V. Vukanovic, G.A. Takacs, E.A. Matuszak, F.D. Egitto, F. Emmi and R.S. Horwath,
J. Vac.
Sci. Technol.
, B 6, 66 (1988).
18. N.J. Chou, J. Paraszczac, E. Babich, J. Heidenreich, Y.S. Chaug and R.D. Goldblatt,
J. Vac. Sci.
Technol.
, A 5, 1321 (1987).
19. B. Lamontagne, A.M. Wrobel, G. Jalbert and M.R. Wertheimer,
J. Phys. D
, 20, 844 (1987).
20. V. Vukanovic, G.A. Takacs, E.A. Matuszak, F.D. Egitto, F. Emmi and R.S. Horwath,
J. Vac.
Sci. Technol.
, A 4, 698 (1986).
21. A.S. Dawson, M.S.K. Chen and C.C. Dong,
Proc. ISHM
, 512 (1994).
22. J. Leu and K.F. Jensen,
J. Vac. Sci. Technol.
,
19
, 2948 (1991).
23. G. Bootcock and J. Cvetanovic,
Can. J. Chem.
, 39, 2436 (1961).
24. G. Bootcock and J. Cvetanovic,
Can. J. Chem.
, 36, 623 (1958).
25. R. Klein and M.D. Sheer,
J. Phys. Chem.
, 74, 613 (1970).
26. R.D. Cadle and J.W. Powers,
J. Phys. Chem.
, 71, 1702 (1967).
27. C.H. Bamford,
Comprehensive Chemical Kinetics
, p. 111, Elsevier (1976).
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