Chemistry Reference
In-Depth Information
Figure 4. FT-IR spectra of the fibrils at the PI surfaces which were soluble in chloroform after the
PI films were etched with 100% O
2
plasma (a), and 70% O
2
/ 30% NF
3
(b).
and -(C=O)-O (289.5 eV) moieties appeared at the surfaces. When the PI film was
etched with 100% O
2
plasma or 70% O
2
/ 30% NF
3
plasma, the amount of oxygen
at the surface was increased. When the PI film was etched with 20% O
2
/ 80%
NF
3
plasma, peaks representing -CF (290.7 eV) and -CF
2
(292.4 eV) moieties ap-
peared at the surface. Even if the PI film was etched with 70% O
2
/ 30% NF
3
plasma, fluorine at the surface was small in quantity. However, when it was
etched with 20% O
2
/ 80% NF
3
plasma, the amount of fluorine at the surface was
remarkably increased.
Figure 4 shows the FT-IR spectra of the fibrils at the PI surfaces which were
soluble in chloroform after the PI films were etched with 100% O
2
plasma (a),
and 70% O
2
/ 30% NF
3
(b). The peaks representing carbonyl moiety (1740 cm
-1
)
-1
-1
and ether moiety (1250 cm
) appeared. The peak intensity of the
ether moiety in the fibril at the PI surface etched with 30% NF
3
/ 70% O
2
plasma
was much larger than that on the surface etched with 100% O
2
plasma.
and 1090 cm
3.2. Analysis of outgassing from etched PI films
Figures 5a, b and c show the QMS spectra of the outgas during etching with
100% O
2
plasma, 70% O
2
/ 30% NF
3
plasma and 20% O
2
/ 80% NF
3
plasma, re-
spectively. The main products of 100% O
2
plasma etching were H
2
O
+
+
, CO
or
N
2
+
, CO
2
+
+
, O
2
+
+
originated from the inlet oxygen. In addition to
these peaks, the peak representing HF
or N
2
O
and O
+
appeared for etching with 70% O
2
/ 30%
NF
3
plasma and 20% O
2
/ 80% NF
3
plasma.
Search WWH ::
Custom Search