Atomic Layer Deposition in Nanoporous Catalyst Materials - Atomically-Precise Methods for Synthesis of Solid Catalysts - page 170

d n 9 r 4 n g | 7

Figure 7.2 Saturation of the TiO 2 coverage against the exposure time of the Ti

precursor (TDMAT) at 200 1C. The dashed line serves as a guide to the
eye. The relative TiO 2 coverage was obtained from X-ray fluorescence
measurements.

.

Figure 7.3 Linear growth of the TDMAT/H 2 O process on a SiO 2 surface. The gray
line is a linear fit to the data points. Every ALD cycle results in the
deposition of 0.06 nm of TiO 2 . The film thickness was obtained from
spectroscopic ellipsometry measurements.

no further deposition can take place near the pore mouths and precursor
molecules will diffuse into the structure to also coat the internal surface of
the pores.