Atomic Layer Deposition in Nanoporous Catalyst Materials - Atomically-Precise Methods for Synthesis of Solid Catalysts - page 167

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CHAPTER 7
Atomic Layer Deposition in
Nanoporous Catalyst Materials

JOLIEN DENDOOVEN

Ghent University, Department of Solid State Sciences, COCOON,
Krijgslaan 281/S1, Gent B-9000, Belgium
Email: [e-mail]

7.1 Introduction
Atomic layer deposition (ALD) is a thin-film growth method that is
characterized by alternating self-limiting chemisorption reactions of gas
phase precursor molecules with a solid surface. The unique surface-
controlled chemistry of ALD yields a sub-nanometer thickness control and
an excellent conformality on complex three-dimensional (3D) substrates. As
will become clear throughout this chapter, these key advantages render ALD
an enabling technology for the controlled atomic-scale design of supported
catalysts.
This introductory section starts with a brief history and basic principles of
the ALD technique. Next, the focus moves to how ALD proceeds in complex
3D porous networks with pore diameters in the range 1-30 nm. The con-
formal coating of nanometer-sized mesopores and the infiltration of metal
oxide ALD in nanoporous powder particles are discussed by means of ex-
perimental studies. The section then concludes with an outlook on the
versatile opportunities of ALD for catalytic applications.

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