Chemistry Reference
In-Depth Information
Table 3.1 Growth eciency of various gases in a molecular jet growth system. Reprinted (adapted) with permission from ref. 6. Copyright
2005 American Chemical Society.
Temp, a 1C
MWCNT b
SWCNT c
VA-SWCNT d
Carbon source
Formula
Carrier gas
Deposit
Yield
Methane e
CH 4
10% H 2 , 88% He
540-740
N
Ethylene e
C 2 H 4
10% H 2, 88% He
650
N
Acetylene e
C 2 H 2
10% H 2 , 88% He
540-740
Y
N
Y
10
strong
Propylene e
CH 3 CHCH 2
10% H 2 , 88% He
540-740
Y
Y
Y
0.1
no
Benzene f
C 6 H 6
10% H 2 , 90% He
650
N
Xylene f
C 6 H 4 (CH 3 ) 2
10% H 2 , 90% He
650
N
Acetone f
CH 3 COCH 3
10% H 2 , 90% He
540-740
Y
N
Y
1
weak
Diethyl ether f
C 2 H 5 OC 2 H 5
10% H 2 , 90% He
650
Y
N
Y
0.5
no
Methanol f
CH 3 OH
10% H 2 , 90% He
650
Y
N
Y
0.5
no
Ethanol f
CH 3 CH 2 OH
10% H 2 , 90% He
540-740
Y
N
Y
0.5
no
Propanol f
CH 3 CH 2 CH 2 OH
10% H 2 , 90% He
650
Y
N
Y
0.5
no
Carbon monoxide e
CO
10% H 2 , 88% He
540-740
N
a Temperature refers to the temperature of the substrate.
b MWCNT ¼ multiwall carbon nanotube.
c SWCNT ¼ single-wall carbon nanotube.
d VA-SWCNT ¼ vertically aligned SWCNT.
e These experiments were performed in a range of incidence rates from 1.5 10 18 to 5.3 10 18 molecules/(cm 2 s).
f Entrained in carrier gas using a bubbler. The beam composition is determined by the room-temperature vapor pressure.
 
 
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