Chemistry Reference
In-Depth Information
Table 3.1 Growth eciency of various gases in a molecular jet growth system. Reprinted (adapted) with permission from ref. 6. Copyright
2005 American Chemical Society.
Temp,
a
1C
MWCNT
b
SWCNT
c
VA-SWCNT
d
Carbon source
Formula
Carrier gas
Deposit
Yield
Methane
e
CH
4
10% H
2
, 88% He
540-740
N
Ethylene
e
C
2
H
4
10% H
2,
88% He
650
N
Acetylene
e
C
2
H
2
10% H
2
, 88% He
540-740
Y
N
Y
10
strong
Propylene
e
CH
3
CHCH
2
10% H
2
, 88% He
540-740
Y
Y
Y
0.1
no
Benzene
f
C
6
H
6
10% H
2
, 90% He
650
N
Xylene
f
C
6
H
4
(CH
3
)
2
10% H
2
, 90% He
650
N
Acetone
f
CH
3
COCH
3
10% H
2
, 90% He
540-740
Y
N
Y
1
weak
Diethyl ether
f
C
2
H
5
OC
2
H
5
10% H
2
, 90% He
650
Y
N
Y
0.5
no
Methanol
f
CH
3
OH
10% H
2
, 90% He
650
Y
N
Y
0.5
no
Ethanol
f
CH
3
CH
2
OH
10% H
2
, 90% He
540-740
Y
N
Y
0.5
no
Propanol
f
CH
3
CH
2
CH
2
OH
10% H
2
, 90% He
650
Y
N
Y
0.5
no
Carbon monoxide
e
CO
10% H
2
, 88% He
540-740
N
a
Temperature refers to the temperature of the substrate.
b
MWCNT
¼
multiwall carbon nanotube.
c
SWCNT
¼
single-wall carbon nanotube.
d
VA-SWCNT
¼
vertically aligned SWCNT.
e
These experiments were performed in a range of incidence rates from 1.5
10
18
to 5.3
10
18
molecules/(cm
2
s).
f
Entrained in carrier gas using a bubbler. The beam composition is determined by the room-temperature vapor pressure.
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