Biomedical Engineering Reference
In-Depth Information
glass slide
vacuum
evaporation
Cr/Au
p
hotoresist
ph
otoresist
hotolithography
photolithography
UV irradiation
UV irradiation
etching
Fig. 4.7.
The fabrication procedure of microelectrodes on a chip
H3C
N
N
N
3HCl
¥
5H
2
O
N
N
H
N
H
OH
Hoechst 33258
Ex : 365nm
Em: 465nm
none
Hoechst 33258
150
100
50
0
-50
-200
0
200
400
600
800
E vs. Ag/AgCl (mV)
Fig. 4.8.
The cyclic voltammogram of 100
M Hoechst 33258 in 0.2 M phosphate
buffer at 100 mV/s. Electrode area 200
×
200
μ
m
2
μ
