Chemistry Reference
In-Depth Information
(electrons, positive/negative ions, excited particles, chemical reactive neu-
tral particles) and the plasma-surface interaction represent a multi-scale
problem in space and time. The challenge in modeling is the development of
suitable hybrid models (2D, 3D) by combination of kinetic (e.g., Boltzmann
equation, PIC-MCC) and fluid description as well as the appropriate inclu-
sion of the surface processes, for example, by collisions models (D-TRIM)
or molecular dynamic (MD) simulation.
2. Plasma process modeling by use of Computer Aided Design (CAD) tools
for the design of plasma equipment. Here, 2D and 3D computer models for
plasma materials processing, and plasma remediation of toxic gases, are key
topics. In particular, simulations and visualizations of processes in technical
plasma reactors are important for application in industry. Currently, the
Hybrid Plasma Equipment Model (HPEM) is now in use by semiconductor
equipment suppliers and chip manufacturers.
Nevertheless, the remaining bottleneck is still the availability and verification of
atomic and molecular date of the plasma particles (collision cross sections) for the
relevant systems, or the reliability of data sets is not guaranteed for all parameter,
in particular at low electron temperatures large uncertainties remain. Furthermore,
detailed knowledge about the microphysics of the interface between the condensed
(wall, material surface) and the plasma phase is missing. The relevant data are
mostly determined by macroscopic quantities (e.g., particle flux, sticking coefficient,
secondary species emission coefficient). Thereby, intrinsic variations of surface data
exist, for example, from micro roughness compared to “ideal surfaces” like single
crystals. Moreover, chemical surface modification and adsorbate layers have to be
considered.
The complexity of the system and the large number of input data needs systematic
study of error propagation for coupled calculations that is often lacking. Coupling
more and more codes will just amplify their individual errors and no reliable result
will be possible.
10.6 EDUCATION AND QUALIFICATION IN PLASMA PHYSICS
AND CHEMISTRY
Future developments in low-temperature plasma science and the application in inno-
vative technologies need educated human resources. In nonthermal plasma physics
and chemistry the colleges and universities are in the responsibility to educate and
qualify the necessary experts. This topic may help to promote this matter of interest.
