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1400
1200
1000
1
2
3
4
5
6
800
600
400
200
0
0.0
0.5
1.0
1.5
p [mbar]
FIGURE 6.8 Translational and rotational temperatures in a planar microwave discharge
(64% H 2 +
16% D 2 +
20% Ar, P =
1.5 kW) and their dependence on pressure, 1, 2, and 3:
translational temperatures derived from Doppler broadening of D α ,H α ,andH 2 spectral lines
respectively; 4, 5, and 6: rotational temperatures of the X 1
0 state of H 2 obtained from
the Q (0-0), Q (1-1), and Q (2-2) branches of the Fulcher-α bands. (From Röpcke, J. et al., J.
Phys.IV , 8, 207, 1998, ThirdInternationalWorkshoponMicrowaveDischarges-Fundamentals
and Applications , April 20-25, 1997, Fontevraud Abbey, France.)
g , ν
=
applications in plasma technology) is the application of internal checks within the
method—to use simultaneously the emission of several different bands and band
systems [177,188], different isotopomers (like H 2 , HD, and D 2 [192]), or different
molecules [175,191] to determine T , which has obviously a specific value for every
condition.
As an example Figure 6.8 shows the results obtained in a planar microwave
discharge [175]. Agreement was found to be within 10%-15% between the
rotational temperature, derived from the (0-0), (1-1), (2-2) Fulcher-α bands, and the
translationaltemperaturesofhydrogenanddeuteriumatomsandhydrogenmolecules.
6.3.3.3.3 Vibrational Temperature
Population density distributions over vibrational levels have a non-Boltzmann char-
acter in gas discharge plasmas [200]. Nevertheless, the vibrational temperature T vib
is widely used for very rough estimates of these distributions. Since the original
measurement of the emission band intensities has been proposed for determining
T vib in N 2 discharges by OES [201], the method has often been used in low-pressure
plasma diagnostics. In particular, it looks promising for the in-situ control of tem-
perature during plasma processing. The method has been generalized by taking into
account the resolved rotational structure of H 2 bands [196], which is important for
 
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