Chemistry Reference
In-Depth Information
781. R. B. Wehrspohn, J.-N. Chazalviel, F. Ozanam, and I. Solomon, Electrochemistry and photolumines-
cence of porous amorphous silicon,
Thin Solid Films
297
, 5, 1997.
782. H. W. Lau, G. J. Parker, and R. Greef, High aspect ratio silicon pillars fabricated by electrochemical
etching and oxidation of macroporous silicon,
Thin Solid Films
276
, 29, 1996.
783. F. Ronkel, J. W. Schultze, and R. Arens-Fischer, Electrical contact to porous silicon by electrodepo-
sition of iron,
Thin Solid Films
276
, 40, 1996.
784. C. Pavelescu, C. Cobianu, L. Condriuc, and E. Segal, Etch rate behaviour of films chemically
vapour deposited from silane, oxygen and nitrogen gas mixtures at low temperatures,
Thin Solid Films
114
, 291, 1984.
785. S. S. Cohen, Contact resistance and methods for its determination,
Thin Solid Films
104
, 361, 1983.
786. L. K. White, Etch rates of
films in deuterated acidic fluorides,
Thin Solid Films
79
, L73,
1981.
787. G. Mende, Uber den Einflub der Ionenimplantation auf die Geschwindigkeit der Anodischen Siliziu-
moxydation,
Thin Solid Films
78
, 335, 1981.
788. E. Guerrero, G. Tobolka, and A. Baghai, Calibration for the anodic oxidation of silicon,
Thin Solid
Films
76
, 237, 1981.
789. L. A. Nagahara, T. Ohmori, K. Hashimoto, and A. Fujishima, The influence of hydrofluoric acid con-
centration on electroless copper deposition onto silicon,
J
.
Electroanal. Chem.
333
, 363, 1992.
790. G. Mende, Uber die Selektive Anodische Oxydation von n-Silizium,
Thin Solid Films
55
, 427, 1978.
791. Y. Nakato, K. Ueda, H. Yano, and H. Tsubomura, Effect of microscopic discontinuity of metal over-
layers on the photovoltages in metal-coated semiconductor-liquid photoelectrochemical cells for
efficient solar energy conversion,
J. Phys. Chem.
92
, 2316, 1988.
792. R. A. Haken, I. M. Baker, and J. D. E. Beynon, An investigation into the dependence of the chemi-
cally-etched edge profiles of silicon dioxide films on etchant concentration and temperature,
Thin Solid
Films
18
, S3, 1973.
793. R. Nannoni and M. J. Musselin, Anodic oxidation of silicon effects of water on oxide properties,
Thin
Solid Films
6
, 397, 1970.
794. P. Allongue, C. H. de Villeneuve, M. C. Bernard, J. E. Peou, A. Boutry-Forveille, and C. Levy-
Clement, Relationship between porous silicon formation and hydrogen incorporation,
Thin Solid Films
297
, 1, 1997.
795. G. Sotgiu, L. Schirone, and F. Rallo, On the use of surfactants in the electrochemical preparation of
porous silicon,
Thin Solid Films
297
, 18, 1997.
796. P. Steiner, A. Wiedenhofer, F. Kozlowski, and W. Lang, Influence of different metallic contacts on
porous silicon electroluminescence,
Thin Solid Films
276
, 159, 1996.
797. F. Kozlowski, C. Sailer, P. Steiner, B. Knoll, and W. Lang, Time-resolved electroluminescence of
porous silicon,
Thin Solid Films
276
, 164, 1996.
798. B. Gelloz, A. Bsiesy, F. Gaspard, and F. Muller, Conduction in porous silicon contacted by a liquid
phase,
Thin Solid Films
276
, 175, 1996.
799. Th. Dittrich, I. Sieber, S. Rauscher, and J. Rappich, Preparation of thin nanoporous silicon layers on
n- and p-Si,
Thin Solid Films
276
, 200, 1996.
800. D. J. Monk, D. S. Soane, and R. T. Howe, A review of the chemical reaction mechanism and kinet-
ics for hydrofluoric acid etching of silicon dioxide for surface micromachining applications,
Thin Solid
Films
232
, 1, 1993.
801. V. Lehmann, F. Hofmann, F. Moller, and U. Gruning, Resistivity of porous silicon: A surface effect,
Thin Solid Films
255
, 20, 1995.
802. M. Jeske, J. W. Schultze, M. Thonissen, and H. Munder, Electrodeposition of metals into porous
silicon,
Thin Solid Films
255
, 63, 1995.
803. A. Bsiesy, F. Gaspard, R. Herino, M. Ligeon, F. Muller, R. Romestain, and J. C. Vial, Voltage-induced
modifications of porous silicon luminescence,
Thin Solid Films
255
, 80, 1995.
804. P. Joubert, A. Abouliatim, P. Guyader, D. Briand, B. Lambert, and M. Guendouz, Growth and lumi-
nescence of n-type porous polycrystalline silicon,
Thin Solid Films
255
, 96, 1995.
805. I. Haller, Y. H. Lee, J. J. Nocera, Jr., and M. A. Jaso, Selective wet and dry etching of hydrogenated
amorphous silicon and related materials,
J. Electrochem. Soc.
135
(8), 2042, 1988.
806. H. Nagayama, H. Honda, and H. Kawahara, A new process for silica coating,
J. Electrochem. Soc.
135
(8), 2013, 1988.
