Chemistry Reference
In-Depth Information
According to Meerakker and Vegchel,
195
,
196
the etching process has different
kinetics at high and low
ratios as shown in Fig. 7.7. A rate equation for etching
in
solutions with high
ratios (>20) can be expressed as
where
r
is in micrometers per minute and concentrations are molar. At low
ratios (<10) the rate equation is
The details of the reactions on silicon electrodes in solutions are presented
in Chapter 6. The information on defect etching in some specific etching solutions is
presented in Section 7.8.1.
