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underneath as shown in Fig. 4.12. On the other hand, the dissolution of thermal
in BHF solutions is found to be impeded by the application of a cathodic potential of
2-4V across the oxide film.
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4.4. QUARTZ AND FUSED SILICA
Quartz, being the single-crystalline form of silicon oxide, is dense and has very
low etch rates in HF solutions compared to other forms of oxides as shown in Fig. 4.2.
The etching of quartz in HF solutions has been extensively investigated by Vondel-
ing,
671
who measured the etch rates in HF and
with addition of various
amounts of KF,
KCl, and
Some of the etch rate values
