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solution containing a stabilizing agent such as or 0.1M Fe(II) EDTA.
The Fe(II) is oxidized by holes, which reduces the rate of silicon oxide formation so
that the surface can remain relatively “bare” during the course of measurement.
2.7.2. Effect of Surface Condition
Surface states at a silicon/electrolyte interface are determined by the preparation
prior to entering the electrolyte and by the changes that occur in the electrolyte. Thus,
in general, an experimentally determined flatband potential is specific to the particular
silicon/electrolyte interface at a given time and may significantly vary even with the
same material and electrolyte.
Figure 2.30 shows that different polishing processes result in different flatband
potential values in a 5% HF solution. 901 Annealing after cleaning and etching was seen
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