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HA-AA0
MA-AA0
500 nm
(a)
MA-AA0
HA-AA0
200 nm
(b)
8.10
Panel (a) shows alternate layers of anodic aluminum oxide (AAO)
prepared by 'pulse' anodization; the layers are representative of 'hard'
anodization (HA) and 'mild' anodization (MA). Panel (b) is a
magnifi cation of the displayed rectangular area. From W. Lee
et al.
(2008).
to prepare nanoparticles under controlled conditions, specifi cally in the
manufacture of 'gold blacks' for darkening of thermocouples by gold
nanoparticles prepared by evaporation at pressures high enough to yield
nanoparticle nucleation and growth of fractal aggregates in the gas phase
(Harris
et al.
, 1948; Granqvist and Hunderi, 1977; Sotelo
et al.
, 2002).
A major step forward for the latter technique was taken when it was
realized that the mean particle diameter and the size distribution could be
understood and accurately modelled provided that the vapour source was
equipped with accurate temperature control (Granqvist and Buhrman,
1976). This led to the 'advanced gas deposition' (AGD) technique, which is
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