Chemistry Reference
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for infinitesimal changes in
µ
and
σ
can be written as,
δσ
σ
= δµ
µ
+ δQ n
Q n
(1)
For suciently large oxide thickness,
|δQ n |
=
|δQ T |
,where
δQ T
is the
change in trapped charge.
To calculate the contribution from number fluctuations, let's take a
volume element ∆
V
and energy element ∆
E
inside the SiO 2
such that
the trapping events inside ∆
V
E
can be characterized by a single time
constant
τ T
. We assume that the fluctuations come from the traps situated
afew
above or below the quasi-Fermi level of graphene. The power
spectral density of the fluctuation arising from ∆
k B T
V
E
is found by taking
the Fourier transform of the autocorrelation of
δn V E ,givenby
τ T
1+
S n V E =
ω 2 τ T n tr (
x, E
)
f T (1
− f T )∆
V
E
(2)
where
n tr
is the trap density of states per unit volume times energy,
ω
is
the frequency expressed in radians,
f T
is the probability of a trap being
filled.
In our model, we assume that the Coulomb potential due to a trapped
charge will also give rise to the fluctuation in mobility. Using Mathiessen's
rule 51 we can write
1
µ
1
µ avg
1
µ T
=
+
(3)
where
µ avg is the time averaged mobil-
ity, from all static scattering mechanism. The term
µ
is the instantaneous mobility,
µ 1
T
arises from the
Coulomb scattering off the trapped charge that fluctuates between the ox-
ide and graphene. Consider a channel element ∆
, where we concentrate
on the fluctuation in number and mobility of the graphene channel due to
the fluctuation of trap charges in ∆ V E inside SiO 2 .So
1
µ T
y
z
)( δQ n
y
z
=Σ(
x
)
(4)
WL
x
where Σ(
) is related to the scattering rate entirely due to the Coulomb
potential of the trapped charge located inside the substrate at a distance x
from graphene.
Simple mathematical calculations show that power spectral density in
the source-drain current consists of three terms
S V
=
S V 1 +
S V 2 +
S V 3
(5)
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